Create, save, and refine patterns with less interruption
This two-week update adds a text-to-pattern workflow, clearer creation paths, optional account continuity, browser-local recovery, stronger color and export tools, and a more reliable route from editing to publication.
More ways to start
Begin from the source that already matches your idea, then move into the same bead-ready workflow.
- The new text pattern generator turns up to four lines of letters, numbers, or Chinese characters into a bead grid, with layout effects, templates, PNG/PDF export, and transfer to the drawing canvas.
- Creation entry points now clearly separate image conversion, drawing on a blank canvas, and text-based patterns.
- Finished work from the drawing canvas and text generator can be submitted to the Pattern Library when you choose to publish it.
Faster pattern cleanup
Common finishing work now takes fewer manual edits and gives clearer material feedback.
- Horizontal mirroring is available in the image generator, text generator, and drawing canvas.
- The drawing canvas can highlight every bead using one color, replace a color across the pattern, or remove several unwanted colors at once.
- Perler, Hama, and Artkal references were refreshed, while PDF and PNG exports gained clearer color-code display options.
- Reference-grid calibration is more reliable when an imported pattern has uneven spacing or difficult grid lines.
Safer continuity
Your working state is easier to recover, while local and cloud storage remain separate choices.
- Image and text generators now keep recoverable drafts in the current browser, with visible saving, saved, retry, and cross-tab conflict states.
- Optional accounts support email-code or Google sign-in, a consistent public username, and account settings without making sign-in necessary for creating or exporting.
- Signed-in creators can save private cloud projects, continue across devices, manage favorites, and maintain a creator profile. Local drafts are not uploaded automatically.
Clearer sharing and feedback
Public discovery and feedback now make it easier to find recent work and report what needs attention.
- The Pattern Library shows the latest approved patterns first by default.
- A dedicated feedback form accepts product problems, feature suggestions, and content corrections without requiring sign-in.
- The MARD color chart now explains common retail ranges and special-effect series, while publication review and public delivery were made more reliable.
Something still gets in the way of your project? Send the page, steps, and expected result so we can investigate.
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